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Femtosecond laser near-field nanoablation patterning using Mie resonance high dielectric constant particle with small size parameter
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10.1063/1.3458704
/content/aip/journal/apl/96/26/10.1063/1.3458704
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/26/10.1063/1.3458704
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Near-field scattering efficiency of a 200 nm dielectric particle as a function of refractive index of particle with various extinction coefficients .

Image of FIG. 2.
FIG. 2.

Simulated optical intensity enhancement factors and spot diameter (FWHM) with a 200 nm dielectric particle deposited on (a) and (b) Si substrate surfaces as a function of refractive index of particle with various extinction coefficients .

Image of FIG. 3.
FIG. 3.

SEM images of fabricated nanoholes using a 200 nm amorphous particle on (a) and on (b) Si substrate surfaces with different laser fluencies. The dashed line shows delineation of the applied particle.

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/content/aip/journal/apl/96/26/10.1063/1.3458704
2010-06-29
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Femtosecond laser near-field nanoablation patterning using Mie resonance high dielectric constant particle with small size parameter
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/26/10.1063/1.3458704
10.1063/1.3458704
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