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A two-step plasma processing for gold nanoparticles supported on silicon near-infrared plasmonics
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10.1063/1.3291670
/content/aip/journal/apl/96/4/10.1063/1.3291670
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/4/10.1063/1.3291670
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Figures

Image of FIG. 1.
FIG. 1.

Schematic representation of the two-step sputtering process of Au NPs. (1) Au sputtering to nucleate metal seeds; (2) annealing; (3) plasma; and (4) second sputtering step to tailor NPs size.

Image of FIG. 2.
FIG. 2.

SE experimental spectra of the pseudoextinction coefficients of NPs films produced by Au sputtering of 50–150 MLs of Au on c-Si (111) exploiting the single-step sputtering (open symbols) and the two-step sputtering methodology (full symbols). The three-dimensional (3D) AFM images of Au NPs corresponding to 50 and 100 MLs of Au deposited by the single-step and the two-step sputtering are also shown. For all AFM images vertical scale is the same of 40.97 nm.

Image of FIG. 3.
FIG. 3.

Dependence of the SPR wavelength and energy on the Median height and on the diameter, as determined from AFM analysis of Au NPs deposited by the single-step (empty symbols) and the two-step (full symbols) sputtering methodologies. The dashed square indicates the regime of nucleation of Au seeds (i.e., the first Au similarly deposited for the two methodologies). The AFM images for typical Au NPs samples deposited by the single-step and two-step sputtering are also shown. In the 3D AFM images, the vertical scale is 45.17 nm for both.

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/content/aip/journal/apl/96/4/10.1063/1.3291670
2010-01-25
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: A two-step plasma processing for gold nanoparticles supported on silicon near-infrared plasmonics
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/4/10.1063/1.3291670
10.1063/1.3291670
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