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A microtip self-written on a vertical-cavity surface-emitting laser by photopolymerization
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10.1063/1.3303980
/content/aip/journal/apl/96/5/10.1063/1.3303980
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/5/10.1063/1.3303980
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Principle of microtip fabrication: (a) IR sensitive resist local deposition on the VCSEL wafer followed by IR exposure created by VCSEL emission. (b) Resulting microtip obtained after rinsing.

Image of FIG. 2.
FIG. 2.

SEM image of a microtip self-written at the center of a 763 nm single mode VCSEL. (a) The applied current is 0.6 mA and the resist thickness is . Inset: zoom on the microtip. (b) SEM view of a microtip fabricated using the same applied current (0.6 mA) and a higher resist thickness . In both cases, the height of the tip is found to be equal to the initial resist thickness.

Image of FIG. 3.
FIG. 3.

(a) cw characteristics measured under probes for a VCSEL device without tip (straight curves) and with an integrated tip (4.2 thick/dotted curves). (b) Beam spot width measured in function of the distance to the VCSEL surface for two tips created with two different resist thicknesses: (circles) and (triangles) and compared to a reference sample with no tip (squares).

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/content/aip/journal/apl/96/5/10.1063/1.3303980
2010-02-03
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: A microtip self-written on a vertical-cavity surface-emitting laser by photopolymerization
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/5/10.1063/1.3303980
10.1063/1.3303980
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