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Stress impact on dielectric properties of films
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10.1063/1.3302460
/content/aip/journal/apl/96/7/10.1063/1.3302460
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/7/10.1063/1.3302460
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

XRD patterns of BNdT films. Inset is hysteresis loop of the film.

Image of FIG. 2.
FIG. 2.

(a) Dielectric constant and (b) loss with applied stress. Inset of 2(a) is as a function of testing ac electric field.

Image of FIG. 3.
FIG. 3.

(a) Dielectric constant as a function of applied stress at different testing ac electric fields. (b) Slope of the fitting curves in 3(a) vs ac field. Inset of 3(b) is the 70 MPa-tension-caused relative variation of dielectric constant as a function of ac field. is the dielectric constant with 70 MPa tension and is that without applied stress measured at the same ac filed.

Image of FIG. 4.
FIG. 4.

(a) 70 MPa-compression-caused relative variation (absolute value) of dielectric constant as a function of temperature. is the dielectric constant with 70 MPa compression and is that without applied stress measured at the same temperature. Inset of 4(a) shows the dielectric constant with temperature for a free sample. (b) Dielectric constant as a function of dc bias field.

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/content/aip/journal/apl/96/7/10.1063/1.3302460
2010-02-16
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stress impact on dielectric properties of Bi3.15Nd0.85Ti3O12 films
http://aip.metastore.ingenta.com/content/aip/journal/apl/96/7/10.1063/1.3302460
10.1063/1.3302460
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