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FT-IR absorbance versus wavenumber , shown with offsets for better viewing. The nitrogen to silane precursor gas ratio increases from film A to E.
(a) Photograph of notch-type aluminum LC resonator with a parallel plate capacitor. Size of the capacitor (shown in right) is . The substrate is sapphire which appears black in the photograph. (b) Loss tangent curves of samples A to E measured at 30 mK (shown with markers) with the TLS model fit in Eq. (2) (shown with fit curves).
Density of states as a function of bonding peak area in FT-IR measurement.
film and resonator sample properties: precursor gas ratio , refractive index measured at 633 nm, compressive stress (MPa), ratio of N–H bond concentration to total N–H and Si–H concentration , and resonator loss tangent fit parameters.
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