1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
f
Erratum: “Nanotwin formation in copper thin films by stress/strain relaxation in pulse electrodeposition” [Appl. Phys. Lett.91, 254105 (2007)]
Rent:
Rent this article for
Access full text Article
/content/aip/journal/apl/97/12/10.1063/1.3489689
1.
7.X. Zhang, K. N. Tu, Z. Chen, Y. K. Tan, C. C. Wong, S. G. Mhaisalkar, X. M. Li, C. H. Tung, and C. K. Cheng, J. Nanosci. Nanotechnol. 8, 2568 (2008).
http://aip.metastore.ingenta.com/content/aip/journal/apl/97/12/10.1063/1.3489689
Loading
/content/aip/journal/apl/97/12/10.1063/1.3489689
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/97/12/10.1063/1.3489689
2010-09-22
2014-10-25

Abstract

There is no abstract available for this article.

Loading

Full text loading...

/deliver/fulltext/aip/journal/apl/97/12/1.3489689.html;jsessionid=1kjc135cbtgqd.x-aip-live-02?itemId=/content/aip/journal/apl/97/12/10.1063/1.3489689&mimeType=html&fmt=ahah&containerItemId=content/aip/journal/apl
true
true
This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Erratum: “Nanotwin formation in copper thin films by stress/strain relaxation in pulse electrodeposition” [Appl. Phys. Lett.91, 254105 (2007)]
http://aip.metastore.ingenta.com/content/aip/journal/apl/97/12/10.1063/1.3489689
10.1063/1.3489689
SEARCH_EXPAND_ITEM