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Erratum: “Nanotwin formation in copper thin films by stress/strain relaxation in pulse electrodeposition” [Appl. Phys. Lett.91, 254105 (2007)]
7.X. Zhang, K. N. Tu, Z. Chen, Y. K. Tan, C. C. Wong, S. G. Mhaisalkar, X. M. Li, C. H. Tung, and C. K. Cheng, J. Nanosci. Nanotechnol. 8, 2568 (2008).
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