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Fabrication process flow of the locally oxidized hybrid plasmonic waveguide. (a) Planar substrate; (b) nitride layer deposition; (c) nitride patterning; (d) local oxidation; (e) nitride strip; and (f) formation of thin oxide gap and metal deposition.
(a) SEM image of the hybrid plasmonic structure with highlighted different material layers. (b) Electromagnetic simulation showing the intensity profile of the mode in the hybrid plasmonic waveguide. We used the actual device dimensions as obtained from the SEM image.
SEM micrograph (top view) of the hybrid plasmonic structure coupled to the photonic waveguides. The near-field scan areas are schematically marked by the shaded yellow ellipses on the image.
Representative NSOM measurement results of the device. (a) Topography image; (b) NSOM image; (c) three-dimensional (3D) representation of the superimposed topography and NSOM images; and (d) 3D representation of NSOM image.
Light intensity attenuation as a function of length as derived from the near-field characterization. The error bars represent the standard deviation of three independent experiments. The dotted line shows the linear fit to the measurements.
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