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Composition of the Si–Sn patterns as deposited on the Cu substrate at different location and XRD peaks of each pattern. (The Si/Sn ratio in the middle is around 50:50).
TEM images showing phase separation of Sn in amorphous Si. (Black is Si and white is Sn, ).
Sn nanowires extruded due to compressive stresses generated by heat treatment (Si substrate). The scale bar is in small inserted images and in large images, respectively. Higher Si content in the coating leads to smaller but longer Sn nanowires.
Stress evolution of Si–Sn coatings during the heating process.
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