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Schematic of the fabrication process showing the three sequential fabrication steps of UV patterning, EFP, and wet-etching.
Plot showing variation in Max RI change before and after EFP.
Optical microscope image of two sets of ridges produced using different UV laser intensities.
Plot of the poling inhibited domain width as a function of the UV laser intensity.
SEM images of the polished end faces of two ridges fabricated with different UV laser intensities (SEM image acquired at 60° tilt).
Near-field intensity profile obtained at 633 nm. The dashed line outlines the physical shape of the ridge structure.
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