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(a) GI-XRD patterns of bare ITO/ATO and a-IGZO films prepared on ITO/ATO. (b) XRD patterns of thick a-IGZO films prepared on glass substrates obtained in Bragg–Brentano geometry. The inset shows the GI-XRD patterns of thick a-IGZO (311) films prepared at 400 and on glass substrates. (c) Cross sectional SEM image of a-IGZO (311) TFT and (d) top view SEM image of a-IGZO (311) film.
Three-dimensional AFM images of (a) bare ATO and a-IGZO (b) 3:1:1, (c) 3:1:2, and (d) 3:1:3 films deposited on ATO.
Output characteristic curves of a-IGZO (a) (311), (b) (312), and (c) (313) TFTs, and (d) transfer characteristics of different a-IGZO TFTs obtained in forward sweep.
Extracted electrical parameters of a-IGZO TFTs.
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