1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Improved epitaxy of ultrathin praseodymia films on chlorine passivated Si(111) reducing silicate interface formation
Rent:
Rent this article for
USD
10.1063/1.3525175
/content/aip/journal/apl/97/24/10.1063/1.3525175
http://aip.metastore.ingenta.com/content/aip/journal/apl/97/24/10.1063/1.3525175

Figures

Image of FIG. 1.
FIG. 1.

High energy (a) and (b) photoelectron spectra of praseodymia films deposited on a passivated (top) and a nonpassivated sample (bottom).

Image of FIG. 2.
FIG. 2.

XSW data (dots) and fits (solid lines) of the photoelectron yield and the reflectivity (Refl.) in (111) direction depending on the incident photon energy for (a) the nonpassivated sample and the passivated samples (b) and (c).

Image of FIG. 3.
FIG. 3.

Calculated coherent fractions for both (111) and (220) Bragg reflections as function of the vertical lattice constant [scaled to the Si(111) bilayer distance ].

Image of FIG. 4.
FIG. 4.

Model of the praseodymia film deposited on Cl-passivated Si(111).

Tables

Generic image for table
Table I.

XSW data of the nonpassivated (top) and passivated (bottom) sample. The numeric error limits are derived from the fitting algorithm used to match the XSW data.

Loading

Article metrics loading...

/content/aip/journal/apl/97/24/10.1063/1.3525175
2010-12-13
2014-04-16
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Improved epitaxy of ultrathin praseodymia films on chlorine passivated Si(111) reducing silicate interface formation
http://aip.metastore.ingenta.com/content/aip/journal/apl/97/24/10.1063/1.3525175
10.1063/1.3525175
SEARCH_EXPAND_ITEM