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Atomic layer deposition of CuCl nanoparticles
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10.1063/1.3525929
/content/aip/journal/apl/97/24/10.1063/1.3525929
http://aip.metastore.ingenta.com/content/aip/journal/apl/97/24/10.1063/1.3525929
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Figures

Image of FIG. 1.
FIG. 1.

Absorbance spectrum of CuCl nanoparticles on a soda-lime glass substrate showing transparency in the visible region and absorption in the UV region. The inset clearly shows the UV region absorption arising from and excitons at 372 and 381 nm, respectively.

Image of FIG. 2.
FIG. 2.

Saturation characteristics of the CuCl ALD process. The curve shows the variation in growth rate (indirectly given by exciton absorption) on increasing the pulse time of both copper and chlorine precursors. A self-limiting behavior is observed from the saturation of growth rate after 12 s pulse time. Inset: SEM images of CuCl nanoparticles grown with a pulse time of 12 s.

Image of FIG. 3.
FIG. 3.

Photoluminescence spectrum of CuCl taken at 5 K showing free exciton emission at 386.7 nm, bound exciton emission at 390.3 nm, and X-band emission at 408 nm.

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/content/aip/journal/apl/97/24/10.1063/1.3525929
2010-12-13
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Atomic layer deposition of CuCl nanoparticles
http://aip.metastore.ingenta.com/content/aip/journal/apl/97/24/10.1063/1.3525929
10.1063/1.3525929
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