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X-ray diffraction profiles of a films deposited at , and . The reflections of the crystalline phases are indexed to the space group adopted by the bulk phase. Note the logarithmic scale of intensity.
(a) Cross-sectional TEM bright-field image of the film deposited at and an amorphous microdiffraction pattern (upper corner) and a diffraction pattern after exposure of a few seconds (lower corner), (b) bright-field image of the film deposited at showing a columnar crystalline phase (dark) and amorphous phase (light) with a diffraction pattern from the crystalline area, (c) dark-field image of the film deposited at with the diffraction pattern taken from an area of approximately 200 nm diameter, and (d) high resolution image of the film deposited at .
(a) Variations of the carrier concentration (diamonds), Hall mobility (circles), and optical mobility (squares) for films as a function of deposition temperature. (b) Optical transmission for a glass substrate (dashed line), polycrystalline film deposited at , and an amorphous film deposited at . The solid lines and dotted lines represent the experimental data and simulated fit, respectively.
Variations of normalized electrical resistivity (a) and Hall mobility (b) with temperature for films deposited at different substrate temperatures.
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