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Two-photon subwavelength lithography with thermal light
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10.1063/1.3472112
/content/aip/journal/apl/97/5/10.1063/1.3472112
http://aip.metastore.ingenta.com/content/aip/journal/apl/97/5/10.1063/1.3472112
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic of experimental setup. is a pseudothermal light source and is the double slit. Two beam splitters, and , and two mirrors, and , form an interferometer, in which two polarizers, and , are orthogonal. A lens in one arm and two lenses in the other arm have the focal lengths and , respectively. is a CCD camera.

Image of FIG. 2.
FIG. 2.

1D patterns registered by the CCD camera when the two beams of the interferometer are coaxial: (a) the averaged intensity distribution ; (b) the intensity fluctuation correlation at symmetric positions ; (c) the intensity fluctuation correlation at the same position ; (d) the intensity interference pattern for the coherent light (the ground glass plate is taken away). Patterns [(a)–(c)] are obtained by averaging over 5000 frames.

Image of FIG. 3.
FIG. 3.

2D patterns registered by the CCD camera when the two beams of the interferometer are off-axis: (a) the intensity interference patterns for the two coherent beams (the ground glass plate is taken away); (b) the subwavelength interference pattern for the intensity fluctuation distribution . Patterns are obtained by averaging over 5000 frames.

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/content/aip/journal/apl/97/5/10.1063/1.3472112
2010-08-03
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Two-photon subwavelength lithography with thermal light
http://aip.metastore.ingenta.com/content/aip/journal/apl/97/5/10.1063/1.3472112
10.1063/1.3472112
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