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Amplified nanopatterning by self-organized shadow mask ion lithography
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10.1063/1.3473770
/content/aip/journal/apl/97/5/10.1063/1.3473770
http://aip.metastore.ingenta.com/content/aip/journal/apl/97/5/10.1063/1.3473770
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Normalized SNMS spectrum: plot of the Au signal from the film (black filled circles) and of the Na signal from the glass (blue empty circles) vs ion dose. Inset: sketch of the experiment. (b) AFM topographies of a polycrystalline Au film sputtered at and (, vertical range 33 nm). The black arrows indicate the direction of the projected ion beam on the sample surface. (c) The glass substrate after the complete exhaustion of the Au shadow mask (, vertical range 160 nm, ). Inset: zoom. [(d) and (e)] Line-by-line averaged 1D-PSD in the direction orthogonal to the ripple elongation corresponding to the topographies (b) and (c).

Image of FIG. 2.
FIG. 2.

(a) Log-log plot of 1D-PSD functions averaged over several AFM topographies. Bottom trace: Au mask (, blue line); Top trace: patterned glass (, red line). Arrows 1 and 2 indicate the position of the peaks well distinguishable in linear scale. The dashed line represents a power law trend. (b) Transfer function describing the roughness amplification from dose to . (c) Evolution of RMS roughness as a function of ion dose; the arrows identify and . Red square and green triangle correspond, respectively, to glass substrates irradiated without the metal mask at and . (d) AFM topography of the patterned glass which has been further irradiated . (e) Glass substrate after direct IBS patterning at a sputtering angle , (, vertical range 12 nm).

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/content/aip/journal/apl/97/5/10.1063/1.3473770
2010-08-02
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Amplified nanopatterning by self-organized shadow mask ion lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/97/5/10.1063/1.3473770
10.1063/1.3473770
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