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Effects of and oxidants on C and N-related impurities in atomic-layer-deposited films observed by in situ x-ray photoelectron spectroscopy
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10.1063/1.3481377
/content/aip/journal/apl/97/9/10.1063/1.3481377
http://aip.metastore.ingenta.com/content/aip/journal/apl/97/9/10.1063/1.3481377
/content/aip/journal/apl/97/9/10.1063/1.3481377
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/content/aip/journal/apl/97/9/10.1063/1.3481377
2010-09-01
2015-03-06
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of O3 and H2O oxidants on C and N-related impurities in atomic-layer-deposited La2O3 films observed by in situ x-ray photoelectron spectroscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/97/9/10.1063/1.3481377
10.1063/1.3481377
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