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Structure and characteristics of ultrathin indium tin oxide films
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10.1063/1.3536531
/content/aip/journal/apl/98/1/10.1063/1.3536531
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/1/10.1063/1.3536531
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) The XRD spectra of 5, 10, 20, 30, 50, and 200 ML ITO thin-films grown on LAO. (b) scan of ITO (222) diffraction peak of 200 ML ITO thin-film.

Image of FIG. 2.
FIG. 2.

AFM 3D images : (a) 5, (b) 20, and (c) 200 ML ITO thin-films grown on LAO substrates.

Image of FIG. 3.
FIG. 3.

The temperature dependence of resistivity for the ITO thin-films with various thicknesses: (a) 200, (b) 50, (c) 20, (d) 10, and (e) 5 ML. The film thickness dependence of the resistivity of ITO films at 300 K is shown in (f). Inset in (f) is a phase diagram of ITO thin-films showing the relationship between transition temperature and the film thickness. The red hatched areas in (f) represent the insulator states of ITO films with thickness below 5 ML.

Image of FIG. 4.
FIG. 4.

(a) The relationship between and for the ITO thin-films of 200, 50, 20, and 10 ML. (b) The relationship between and for the 5 ML ITO thin-film. The solid lines in (a) and (b) are simulated from Eqs. (1) and (2), respectively.

Image of FIG. 5.
FIG. 5.

Optical transmittances of ITO thin-films with thicknesses of 5, 20, and 100 ML.

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/content/aip/journal/apl/98/1/10.1063/1.3536531
2011-01-04
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Structure and characteristics of ultrathin indium tin oxide films
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/1/10.1063/1.3536531
10.1063/1.3536531
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