1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Substrate heating influence on the deposition rate of oxides during pulsed laser deposition in ambient gas
Rent:
Rent this article for
USD
10.1063/1.3565157
/content/aip/journal/apl/98/10/10.1063/1.3565157
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/10/10.1063/1.3565157
/content/aip/journal/apl/98/10/10.1063/1.3565157
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/98/10/10.1063/1.3565157
2011-03-10
2014-08-28
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Substrate heating influence on the deposition rate of oxides during pulsed laser deposition in ambient gas
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/10/10.1063/1.3565157
10.1063/1.3565157
SEARCH_EXPAND_ITEM