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Influences of surface reconstruction on the atomic-layer-deposited metal-oxide-semiconductor capacitors
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10.1063/1.3571293
/content/aip/journal/apl/98/12/10.1063/1.3571293
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/12/10.1063/1.3571293
/content/aip/journal/apl/98/12/10.1063/1.3571293
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/content/aip/journal/apl/98/12/10.1063/1.3571293
2011-03-24
2014-10-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influences of surface reconstruction on the atomic-layer-deposited HfO2/Al2O3/n-InAs metal-oxide-semiconductor capacitors
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/12/10.1063/1.3571293
10.1063/1.3571293
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