1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Orientation dependence of the elastic instability on strained SiGe films
Rent:
Rent this article for
USD
10.1063/1.3576916
/content/aip/journal/apl/98/16/10.1063/1.3576916
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/16/10.1063/1.3576916
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

AFM top-view images of 130-nm-thick as-grown layers (a) on (001) Si substrate and (b) on (111) Si substrate; side views are shaped in (c) and (d), respectively.

Image of FIG. 2.
FIG. 2.

(a) AFM top-view image of 130-nm-thick layers on (111) Si substrate after 20 h anneal; Side view is shaped in (b).

Image of FIG. 3.
FIG. 3.

Critical height (in ML) above which the elastic instability may develop as function of the surface stiffness .

Image of FIG. 4.
FIG. 4.

Characteristic time for the instability to be fully developed as function of the surface stiffness.

Loading

Article metrics loading...

/content/aip/journal/apl/98/16/10.1063/1.3576916
2011-04-22
2014-04-23
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Orientation dependence of the elastic instability on strained SiGe films
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/16/10.1063/1.3576916
10.1063/1.3576916
SEARCH_EXPAND_ITEM