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AFM top-view images of 130-nm-thick as-grown layers (a) on (001) Si substrate and (b) on (111) Si substrate; side views are shaped in (c) and (d), respectively.
(a) AFM top-view image of 130-nm-thick layers on (111) Si substrate after 20 h anneal; Side view is shaped in (b).
Critical height (in ML) above which the elastic instability may develop as function of the surface stiffness .
Characteristic time for the instability to be fully developed as function of the surface stiffness.
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