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Using patterned H-resist for controlled three-dimensional growth of nanostructures
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10.1063/1.3582241
/content/aip/journal/apl/98/16/10.1063/1.3582241
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/16/10.1063/1.3582241
/content/aip/journal/apl/98/16/10.1063/1.3582241
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/content/aip/journal/apl/98/16/10.1063/1.3582241
2011-04-18
2014-10-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Using patterned H-resist for controlled three-dimensional growth of nanostructures
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/16/10.1063/1.3582241
10.1063/1.3582241
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