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HAADF image of bubbles created by a , 50 keV, RT, He implantation in (001) n-silicon followed by an annealing at during 30 min. The bubble marked by an arrow has been analyzed in more details.
EEL spectra extracted from the spectrum image recorded on a 16 nm in diameter He bubble (marked by an arrow in Fig. 1). Top spectrum (black): raw data realigned on the elastic peak and analyzed via MSA, this spectrum is taken in the middle of the bubble. Middle spectrum (blue): extracted spectrum using our procedure (deconvolution of multiple scattering and Si plasmon fitting), taken in the same region than the black spectrum. Bottom spectrum (green): extracted spectrum taken in a region out of the bubble, to show the background signal. A is attributed to the interface plasmon (Refs. 22 and 23), B is the cavity plasmon (Ref. 24), C the silicon plasmon, and D is the He K-edge.
EEL spectra successively measured on the same bubble (all taken from the same region of the bubble marked by an arrow in Fig. 1). In the inset, estimated He density [through Eq. (2)] as a function of the successive measurements for four different bubbles.
Shift in the He K-edge as compared to its position in atomic He as a function of the estimated He density. Full line (black): linear fit of the whole data set (all bubbles). Dashed line (red): linear fit of data points recorded for Bubble 1.
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