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Electrical passivation and chemical functionalization of SiC surfaces by chlorine termination
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10.1063/1.3587767
/content/aip/journal/apl/98/18/10.1063/1.3587767
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/18/10.1063/1.3587767

Figures

Image of FIG. 1.
FIG. 1.

(a) XPS survey spectra, (b) and (c) core level spectra of (0001) after wet chemical treatment with HF (open circles) and chlorine termination (open squares).

Image of FIG. 2.
FIG. 2.

CPD and SPV data of chlorinated (0001) (open squares and open circles) and (full squares and full circles) as a function of time under UHV conditions.

Image of FIG. 3.
FIG. 3.

XPS core level spectra of chlorine terminated (open squares) and organically functionalized (open triangles) . (a) and (b) show XPS data for the (0001) surface. (c) and (d) show XPS data for the surface. Insets show scans with lower resolution at higher pass energies.

Tables

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Table I.

Summary of wetting behavior investigated by SWCA measurements and surface roughness analysis by AFM. All contact angles are given with an accuracy of ±1°.

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/content/aip/journal/apl/98/18/10.1063/1.3587767
2011-05-06
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrical passivation and chemical functionalization of SiC surfaces by chlorine termination
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/18/10.1063/1.3587767
10.1063/1.3587767
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