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Influence of annular magnet on discharge characteristics in enhanced glow discharge plasma immersion ion implantation
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10.1063/1.3537962
/content/aip/journal/apl/98/2/10.1063/1.3537962
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/2/10.1063/1.3537962
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Distribution of the magnetic flux density in the simulated region, (b) picture of the glow discharge in EGD-PIII with the magnetic field, and (c) picture of the glow discharge in traditional EGD-PIII without the magnetic field. A pulsed bias of −13 kV with a frequency of 50 Hz and pulsing duration of is applied. The argon gas flow rate is 10 SCCM (SCCM denotes cubic centimeter per minute at STP) and the pressure in the vacuum chamber is .

Image of FIG. 2.
FIG. 2.

Influence of the annular magnet on the plasma potential for a pulsed voltage of −13 kV, pulsing frequency of 50 Hz, and argon flow rate of 20 SCCM. The pulse widths are 75, 100, and . Curves 1–6 represent 75, 100, and pulse widths without and with magnet, respectively. The distance between the probe and the anode is 20 mm. (a) and (b) are the same traces but plotted on different time scales of (a) and (b) 7 ms.

Image of FIG. 3.
FIG. 3.

Influence of the annular magnet on the ion density. The probe is 20 mm away from the anode. (a) Different ion densities for a pulsed voltage of −12 kV, pulsing frequency of 50 Hz, and pulse duration of . The argon flow rates are 10, 15, and 20 SCCM. (b) Different ion densities at a pulsing frequency of 50 Hz, pulse duration of , and flow rate of 10 SCCM. The voltages are −12, −14, and −16 kV.

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/content/aip/journal/apl/98/2/10.1063/1.3537962
2011-01-11
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of annular magnet on discharge characteristics in enhanced glow discharge plasma immersion ion implantation
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/2/10.1063/1.3537962
10.1063/1.3537962
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