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Epitaxial integration of ferromagnetic correlated oxide with Si (100)
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10.1063/1.3549301
/content/aip/journal/apl/98/5/10.1063/1.3549301
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/5/10.1063/1.3549301
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

X-ray diffraction scan of on Si. The peaks are indexed using the pseudocubic notation. The inset shows a high-resolution cross-section transmission electron micrograph of on Si with the different layers labeled.

Image of FIG. 2.
FIG. 2.

Magnetization of as a function of temperature at a constant magnetic field of 1 kOe under field-cooled conditions. The film is ferromagnetic with a Curie temperature of 85 K. The inset shows magnetization of as a function of applied magnetic field measured at 10 K. The film has a saturation moment equivalent to per Co.

Image of FIG. 3.
FIG. 3.

Calculated total energy per cell as a function of biaxial tensile strain for nonmagnetic and ferromagnetic structures of . The energies are referenced to the energy of strain-free bulk material. The inset shows the 20-atom tetragonal simulation cell used for the calculations.

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/content/aip/journal/apl/98/5/10.1063/1.3549301
2011-02-01
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Epitaxial integration of ferromagnetic correlated oxide LaCoO3 with Si (100)
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/5/10.1063/1.3549301
10.1063/1.3549301
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