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Transmission electron microscopy of transparent conductive oxide films made by atmospheric pressure chemical vapor deposition
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10.1063/1.3551523
/content/aip/journal/apl/98/5/10.1063/1.3551523
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/5/10.1063/1.3551523
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic representation of the CVD substrate. (a) TEM wafer consisting of 36 fused TEM grids with windows. (b) Cross-sectional view of an individual TEM grid with the electron transparent membrane suspended in a silicon frame.

Image of FIG. 2.
FIG. 2.

Plan view SEM images of early-stage film growth of film deposited by APCVD with variable deposition times: (a) 1 s deposition time, (b) 4 s deposition time, and (c) 60 s deposition time. During growth crystals become larger with longer deposition times.

Image of FIG. 3.
FIG. 3.

Plan view TEM images of early-stage film growth of film deposited by APCVD. (a) Overview with clusters of small crystals grown on top of the membrane with electron diffraction patterns the same as the inset, (b) AFM image of the sample with a line scan, and (c) zoom in on a typical cluster of grains. The noncrystalline area between the grains is bare substrate as confirmed by XPS. (d) Top-view TEM image of twinning in a crystal.

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/content/aip/journal/apl/98/5/10.1063/1.3551523
2011-01-31
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Transmission electron microscopy of transparent conductive oxide films made by atmospheric pressure chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/5/10.1063/1.3551523
10.1063/1.3551523
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