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The high resolution XRD patterns for all major peaks at high temperature annealing stages I–V. The standard positions of relevant planes/phases are indicated by vertical lines (; ; ; ; ; ).
The (−111) interplanar spacing vs annealing time at 1273 K.
(a) A backscattered electron mode scanning electron microscope image of a feature showing a concentration of Ti (dark areas) after the stage III anneal (after Ref. 4). (b) An optical micrograph showing features embedded in the matrix after the stage V anneal.
Raman shift spectra from the matrix and a feature after stage III–V anneals. Vertical lines indicate the positions of standard and phonon shifts.
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