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Solution deposition planarization of long-length flexible substrates
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10.1063/1.3554754
/content/aip/journal/apl/98/7/10.1063/1.3554754
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/7/10.1063/1.3554754
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

AFM scans of bare Hastelloy substrate (a), with a rms roughness of 9.8 nm, and after a sequence of solution deposition coatings to planarize the surface (b), with a rms roughness of 0.56 nm. Note the difference in the height scales between (a) and (b).

Image of FIG. 2.
FIG. 2.

TEM cross-sectional micrograph of a SDP coated substrate with an IBAD-MgO layer and a superconductor layer on top is shown in (a). STEM image of a substrate smoothing detail is shown in (b).

Image of FIG. 3.
FIG. 3.

rms roughness, over a area, as a function of the number of SDP coatings for and solutions is shown in (a); (b) shows the rms roughness for the solution coatings, as in (a), followed by coatings with a solution.

Image of FIG. 4.
FIG. 4.

MgO texture as a function of surface rms roughness, out-of-plane FWHM in (a) and in-plane FWHM in (b). Filled circle symbols represent the SDP solution data and squares represent the data. Small open circles represent data from mechanically polished samples.

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/content/aip/journal/apl/98/7/10.1063/1.3554754
2011-02-15
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Solution deposition planarization of long-length flexible substrates
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/7/10.1063/1.3554754
10.1063/1.3554754
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