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Schematic diagram illustrating the process flow: (a) the starting LED wafer; (b) silica spheres coated on p-GaN layer; (c) pattern transfer to GaN by ICP etching; (d) shrinkage of spheres using RIE etching; (e) coating followed by liftoff; (f) removal of , giving final structure.
AFM images of the hexagonal-close-packed nanoring arrays.
(a) Room temperature PL spectra of nanoring array under varying excitation energy density. (b) An enlarged view of the PL spectrum near the lasing frequency. (c) PL intensity of the lasing peak at 444.075 nm as a function of pump energy density in logarithmic scale.
(a) FDTD simulated transmittance plot showing resonant modes for three different cell structures; (b) strong optical coupling occurs between adjacent rings in an array.
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