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Impact of static and dynamic stress on threshold voltage instability in high-k/metal gate n-channel metal-oxide-semiconductor field-effect transistors
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10.1063/1.3560463
/content/aip/journal/apl/98/9/10.1063/1.3560463
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/9/10.1063/1.3560463
/content/aip/journal/apl/98/9/10.1063/1.3560463
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/content/aip/journal/apl/98/9/10.1063/1.3560463
2011-03-02
2014-10-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Impact of static and dynamic stress on threshold voltage instability in high-k/metal gate n-channel metal-oxide-semiconductor field-effect transistors
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/9/10.1063/1.3560463
10.1063/1.3560463
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