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Influence of sample processing parameters on thermal boundary conductance value in an Al/AlN system
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10.1063/1.3560469
/content/aip/journal/apl/98/9/10.1063/1.3560469
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/9/10.1063/1.3560469

Figures

Image of FIG. 1.
FIG. 1.

Energy filtered TEM centered on the oxygen edge at 525 eV in 3 conditions: (a) Al evaporated on AlN without surface treatment (sample 1), (b) Al sputtered on AlN with 30 min rf etching of the surface (sample 4), (c) Al evaporated on AlN with 10 min rf etching of the surface prior to deposition (sample 5). The oxygen-rich layer between the metal and the substrate is , , and in thickness for case (a), (b), and (c), respectively.

Image of FIG. 2.
FIG. 2.

Contributions of local gradients to the total gradient present in the sample for 2 TBC of 43 and ; , , and stand for layer, boundary, and substrate, respectively.

Tables

Generic image for table
Table I.

Summary of the extracted TBCs with respect to the sample and the data extraction technique. The exponential time constant is taken between 200 and 800 ps. The stands for TBC as measured with an exponential (exp superscript) or inverse (Inv superscript) method.

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/content/aip/journal/apl/98/9/10.1063/1.3560469
2011-02-28
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of sample processing parameters on thermal boundary conductance value in an Al/AlN system
http://aip.metastore.ingenta.com/content/aip/journal/apl/98/9/10.1063/1.3560469
10.1063/1.3560469
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