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(Color online) TMR vs. top CoFeB layer thickness after annealed at 300 °C for 40 min and 80 min using a CTA system.
TMR curves of the p-MTJ after annealed for different amount of time at 340 °C.
(Color online) (a) Evolution of TMR, RP, and RAP for the p-MTJ showing in Figure 2. (b) Evolution of coercivity for top (black square) and bottom (red dot) electrodes in the same junction and the evolution of anisotropy field (blue triangle) for the top CoFeB film measured by VSM. Inset shows the AHE measurement of the bottom electrode on a patterned Hall bar after annealing for different time durations.
(Color online) Evolution of TMR with annealing time at different temperatures, by either a RTA or CTA process. Inset shows 117% TMR from one of the MTJs.
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