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(Color online) (a) Schematic of WLC generation and characterization. BS, beam splitter; A, aperture; VA, variable attenuator; G, grating; DM, deformable mirror; Δt, variable delay stage; OMA, optical multichannel analyser. (b) WLC spectrum measured before the grating. The inset shows the spectrum selected by the deformable mirror, at the sample surface. (c) Schematic representation of the pump-induced effects on the reflectivity resulting from changes in the density of states (DOS) for a semiconductor and correlated material.
(Color online) Time and frequency resolved transient reflectivity of LSMO measured with (a) the uncompressed WLC pulse and (b) the compressed pulse. Black dashed lines indicate extracted group delay. (c) Retrieved WLC intensity envelopes for uncompressed (UC), compressed (C), and transform-limited (TL) pulses. (d) Line-outs of the normalized transient reflectivity signal at 650 and 515 nm together with error function fits (dashed lines). The horizontal bars, of width 2σ, indicate the error in determining the half-rise point at each wavelength.
(Color online) (a) Time and frequency resolved transient reflectivity of VO2. (b) Lineout of the reflectivity at 550 nm (with 20 nm bandwidth). The dashed line is the group delay extracted by fitting the phase offset of the phonon for each wavelength. The solid line reproduces the phase obtained from LSMO (shifted by one phonon period).
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