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Investigating the improvement of resistive switching trends after post-forming negative bias stress treatment
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10.1063/1.3645004
/content/aip/journal/apl/99/13/10.1063/1.3645004
http://aip.metastore.ingenta.com/content/aip/journal/apl/99/13/10.1063/1.3645004
/content/aip/journal/apl/99/13/10.1063/1.3645004
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/content/aip/journal/apl/99/13/10.1063/1.3645004
2011-09-29
2014-11-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Investigating the improvement of resistive switching trends after post-forming negative bias stress treatment
http://aip.metastore.ingenta.com/content/aip/journal/apl/99/13/10.1063/1.3645004
10.1063/1.3645004
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