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Stress evolution during the oxidation of silicon nanowires in the sub-10 nm diameter regime
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10.1063/1.3643038
/content/aip/journal/apl/99/14/10.1063/1.3643038
http://aip.metastore.ingenta.com/content/aip/journal/apl/99/14/10.1063/1.3643038
/content/aip/journal/apl/99/14/10.1063/1.3643038
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/content/aip/journal/apl/99/14/10.1063/1.3643038
2011-10-07
2014-11-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stress evolution during the oxidation of silicon nanowires in the sub-10 nm diameter regime
http://aip.metastore.ingenta.com/content/aip/journal/apl/99/14/10.1063/1.3643038
10.1063/1.3643038
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