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Compliant substrate versus plastic relaxation effects in Ge nanoheteroepitaxy on free-standing Si(001) nanopillars
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10.1063/1.3644948
/content/aip/journal/apl/99/14/10.1063/1.3644948
http://aip.metastore.ingenta.com/content/aip/journal/apl/99/14/10.1063/1.3644948
/content/aip/journal/apl/99/14/10.1063/1.3644948
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/content/aip/journal/apl/99/14/10.1063/1.3644948
2011-10-03
2014-09-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Compliant substrate versus plastic relaxation effects in Ge nanoheteroepitaxy on free-standing Si(001) nanopillars
http://aip.metastore.ingenta.com/content/aip/journal/apl/99/14/10.1063/1.3644948
10.1063/1.3644948
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