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Localized charge trapping and lateral charge diffusion in metal nanocrystal-embedded High-κ/SiO2 gate stack
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10.1063/1.3664220
/content/aip/journal/apl/99/22/10.1063/1.3664220
http://aip.metastore.ingenta.com/content/aip/journal/apl/99/22/10.1063/1.3664220
/content/aip/journal/apl/99/22/10.1063/1.3664220
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/content/aip/journal/apl/99/22/10.1063/1.3664220
2011-11-28
2014-08-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Localized charge trapping and lateral charge diffusion in metal nanocrystal-embedded High-κ/SiO2 gate stack
http://aip.metastore.ingenta.com/content/aip/journal/apl/99/22/10.1063/1.3664220
10.1063/1.3664220
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