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Reduction of leakage currents with nanocrystals embedded in an amorphous matrix in metal-insulator-metal capacitor stacks
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10.1063/1.3664395
/content/aip/journal/apl/99/22/10.1063/1.3664395
http://aip.metastore.ingenta.com/content/aip/journal/apl/99/22/10.1063/1.3664395
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Performance of CaTiO3 MIM capacitors (a) Comparison of leakage currents at 1 V vs. CET for different thicknesses. (b) Schottky-plot of median I(V) curves from capacitors with different oxide thicknesses. (c) Thickness vs. CET allows extraction of k-value for variety of oxide thicknesses. A k-value of 58 is extracted from the slope of the fitted line. The intercept at a CET of 0.25 ± 0.18 nm indicates a negligible interfacial layer. Further increase of the thickness results in an increase in k-value up to k ∼ 93.

Image of FIG. 2.
FIG. 2.

(a) HRTEM micrographs shows that only a small amount of the layer is crystalline (encircled black in the CaTiO3 layer). The bottom electrode consists of polycrystalline layer of Pt. (b) A CaTiO3 crystallite is shown between the noble metal electrodes. Along the [] interface of Pt, the CaTiO3 is also grown along the [] direction. The Pt zone axis is [100]. The angle between the (022)Pt layer and (022)CaTiO3 layer is 3°. No interfacial layer is visible. The corresponding Fourier transforms of CaTiO3 and Pt can be seen in (c) and (d), respectively.

Image of FIG. 3.
FIG. 3.

Cross-sectional TEM of a 35 nm thick CaTiO3 layer in a MIM capacitor stack. The oxide layer is completely crystallized. Different grain boundaries can be seen between the grains, reaching from the top to the bottom electrode. The Ru top electrode shows crystallites, although the deposition temperature is as low as 100 °C.

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/content/aip/journal/apl/99/22/10.1063/1.3664395
2011-11-29
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reduction of leakage currents with nanocrystals embedded in an amorphous matrix in metal-insulator-metal capacitor stacks
http://aip.metastore.ingenta.com/content/aip/journal/apl/99/22/10.1063/1.3664395
10.1063/1.3664395
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