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Orientation specific deposition of mesoporous particles
2.D. Grosso, F. Cagnal, G. J. de A. A. Soler-Illia, E. L. Crepaldi, H. Amenitsch, A. Brunet-Bruneau, A. Bourgeois, and C. Sanchez, Adv. Func. Mater 14, 309 (2004).
13.Colloidal Silica: Fundamentals and Application, edited by H. E. Bergna and W. O. Roberts (Taylor & Francis Group, Boca Raton, 2006), Vol. 131.
See supplementary material at http://dx.doi.org/10.1063/1.4897282
for SEM micrographs demonstrating the influence of sonication on the dispersion (Fig. S1); the small-angle x-ray diffractograms of the material before and after the sonication process (Fig. S2); schematic drawing of the chamber (Fig. S3); enlarged version of Fig. 1
(Fig. S4); and enlarged version of Fig. 2
(Fig. S5).[Supplementary Material]
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We present a protocol for a facile orientation specific deposition of plate-like mesoporous SBA-15 silica particles onto a surface (mesopores oriented normal to surface). A drop of an aqueous dispersion of particles is placed on the surface and water vaporizes under controlled relative humidity. Three requirements are essential for uniform coverage: particle dispersion should not contain aggregates, a weak attraction between particles and surface is needed, and evaporation rate should be low. Aggregates are removed by stirring/sonication. Weak attraction is realized by introducing cationic groups to the surface. Insight into the mechanisms of the so-called coffee stain effect is also provided.
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