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Focused-ion-beam induced damage in thin films of complex oxide BiFeO3
3. L. A. Giannuzzi and F. A. Stevie, Introduction to Focused Ion Beams (Springer, Verlag, 2005).
8. I. Pallecchi, L. Pellegrino, E. Bellingeri, A. S. Siri, D. Marré, and G. C. Gazzadi, “Investigation of FIB irradiation damage in La0.7Sr0.3MnO3 thin films,” J. Magn. Magn. Mat. 320, 1945–1951 (2008).
9. A. Schilling, T. Adams, R. M. Bowman, and J. M. Gregg, “Strategies for gallium removal after focused ion beam patterning of ferroelectric oxide nanostructures,” Nanotechnology 18, 035301 (2007).
10. J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh, “Epitaxial BiFeO3 multiferroic thin film heterostructures,” Science 299, 1719 (2003).
11. L. W. Martin, S. P. Crane, Y. H. Chu, M. B. Holcomb, M. Gajek, M. Huijben, C. H. Yang, N. Balke, and R. Ramesh, “Multiferroics and magnetoelectrics: Thin films and nanostructures,” J. Phys.: Condens. Matter 20, 434220 (2008).
13. J. Budai, W. Liu, J. Tischler, Z. Pan, and D. Norton, “Polychromatic X-ray micro-and nanodiffraction for spatially-resolved structural studies,” Thin Solid Films 516, 8013 (2008).
14. H. Béa, B. Dupé, S. Fusil, R. Mattana, E. Jacquet, B. Warot-Fonrose, F. Wilhelm, A. Rogalev, S. Petit, V. Cros, A. Anane, F. Petroff, K. Bouzehouane, G. Geneste, B. Dkhil, S. Lisenkov, I. Ponomareva, L. Bellaiche, M. Bibes, and A. Barthélémy, “Evidence for room-temperature multiferroicity in a compound with a giant axial ratio,” Phys. Rev. Lett. 102, 217603 (2009).
15. W. Siemons, M. D. Biegalski, J. H. Nam, and H. M. Christen, “Temperature-driven structural phase transition in tetragonal-like BiFeO3,” Appl. Phys. Exp. 4, 095801 (2011).
16. G. J. MacDougall, H. M. Christen, W. Siemons, M. D. Biegalski, J. L. Zarestky, S. Liang, E. Dagotto, and S. E. Nagler, “Antiferromagnetic transitions in tetragonal-like BiFeO3,” Phys. Rev. B. 85, 100406 (2012).
17. R. J. Zeches, M. D. Rossell, J. X. Zhang, A. J. Hatt, Q. He, C. H. Yang, A. Kumar, C. H. Wang, A. Melville, C. Adamo, G. Sheng, Y. H. Chu, J. F. Ihlefeld, R. Erni, C. Ederer, V. Gopalan, L. Q. Chen, D. G. Schlom, N. A. Spaldin, L. W. Martin, and R. A. Ramesh, “Strain-driven morphotropic phase boundary in BiFeO3,” Science 326, 977 (2009).
18. C. Beekman, W. Siemons, T. Z. Ward, M. Chi, J. Howe, M. D. Biegalski, N. Balke, P. Maksymovych, A. K. Farrar, J. B. Romero, P. Gao, X. Q. Pan, D. A. Tenne, and H. M. Christen, Adv. Mat. 25, 5561 (2013).
20. M. Tachibana, T. Kolodiazhnyi, and E. Takayama-Muromachi, “Thermal conductivity of perovskite ferroelectrics,” Appl. Phys. Lett. 93, 092902 (2008).
21. J. J. Yang, M. D. Pickett, X. Li, D. A. A. Ohlberg, D. R. Stewart, and R. S. Williams, “Memristive switching mechanism for metal/oxide/metal nanodevices,” Nat. Nanotechnol. 3, 429–433 (2008).
22. C. H. Yang, J. Seidel, S. Y. Kim, P. B. Rossen, P. Yu, M. Gajek, Y. H. Chu, L. W. Martin, M. B. Holcomb, Q. He, P. Maksymovych, N. Balke, S. V. Kalinin, A. P. Baddorf, S. R. Basu, M. L. Scullin, and R. Ramesh, “Electric modulation of conduction in multiferroic Ca-doped BiFeO3 films,” Nat. Mater. 8, 485–493 (2009).
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An unexpected, strong deterioration of crystal quality is observed in epitaxial perovskite BiFeO3 films in which microscale features have been patterned by focused-ion-beam (FIB) milling. Specifically, synchrotron x-ray microdiffraction shows that the damaged region extends to tens of μm, but does not result in measureable changes to morphology or stoichiometry. Therefore, this change would go undetected with standard laboratory equipment, but can significantly influence local material properties and must be taken into account when using a FIB to manufacture nanostructures. The damage is significantly reduced when a thin metallic layer is present on top of the film during the milling process, clearly indicating that the reduced crystallinity is caused by ion beam induced charging.
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