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Fabrication of highly spin-polarized Co2FeAl0.5Si0.5 thin-films
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/content/aip/journal/aplmater/2/4/10.1063/1.4869798
2014-04-15
2014-09-30

Abstract

Ferromagnetic Heusler CoFeAlSi epitaxial thin-films have been fabricated in the L2 structure with saturation magnetizations over 1200 emu/cm3. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates.

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Scitation: Fabrication of highly spin-polarized Co2FeAl0.5Si0.5 thin-films
http://aip.metastore.ingenta.com/content/aip/journal/aplmater/2/4/10.1063/1.4869798
10.1063/1.4869798
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