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Bulk NdNiO and thin films grown along the (001) axis display a 1st order metal to insulator transition (MIT) together with a Néel transition at T = 200 K. Here, we show that for NdNiO films deposited on (111) NdGaO, the MIT occurs at T = 335 K and the Néel transition at T = 230 K. By comparing transport and magnetic properties of layers grown on substrates with different symmetries and lattice parameters, we demonstrate a particularly large tuning when the epitaxy is realized on (111) surfaces. We attribute this effect to the specific lattice matching conditions imposed along this direction when using orthorhombic substrates.


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