(Color online) Schematic of sample stack structure.
(Color online) (a) Schematic of in situ Raman setup and (b) in situ reflectivity setup.
(Color online) Raman spectra of SiLK in water and air media.
Raman spectra of CDO in air.
Decrease in CDO peak intensity with etching time.
(Color online) Increase in CDO peak intensity as the Ta layer etched away followed by a decrease in the peak intensity as the CDO layer etched away.
(Color online) Comparison of Ta to CDO transition using reflection and Raman techniques, using Si peak.
(Color online) Si peak obtained in static and dynamic modes.
Increase in both Si and CDO peak intensities as Ta is removed. Evolution of Si peak during Ta removal (inset).
Effect of load on the slope of Ta to CDO transition in Raman and in reflectivity (inset) techniques.
Effect of laser power on the slope of Ta to CDO transition line in Raman and in reflectivity (inset) techniques.
Comparison of Ta to CDO transition using Raman and reflectivity methods.
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