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Applications of Raman spectroscopy in copper chemical mechanical planarization: In situ detection of tantalum layer to dielectric layer transition
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10.1063/1.2212087
/content/aip/journal/jap/100/1/10.1063/1.2212087
http://aip.metastore.ingenta.com/content/aip/journal/jap/100/1/10.1063/1.2212087
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic of sample stack structure.

Image of FIG. 2.
FIG. 2.

(Color online) (a) Schematic of in situ Raman setup and (b) in situ reflectivity setup.

Image of FIG. 3.
FIG. 3.

(Color online) Raman spectra of SiLK in water and air media.

Image of FIG. 4.
FIG. 4.

Raman spectra of CDO in air.

Image of FIG. 5.
FIG. 5.

Decrease in CDO peak intensity with etching time.

Image of FIG. 6.
FIG. 6.

(Color online) Increase in CDO peak intensity as the Ta layer etched away followed by a decrease in the peak intensity as the CDO layer etched away.

Image of FIG. 7.
FIG. 7.

(Color online) Comparison of Ta to CDO transition using reflection and Raman techniques, using Si peak.

Image of FIG. 8.
FIG. 8.

(Color online) Si peak obtained in static and dynamic modes.

Image of FIG. 9.
FIG. 9.

Increase in both Si and CDO peak intensities as Ta is removed. Evolution of Si peak during Ta removal (inset).

Image of FIG. 10.
FIG. 10.

Effect of load on the slope of Ta to CDO transition in Raman and in reflectivity (inset) techniques.

Image of FIG. 11.
FIG. 11.

Effect of laser power on the slope of Ta to CDO transition line in Raman and in reflectivity (inset) techniques.

Image of FIG. 12.
FIG. 12.

Comparison of Ta to CDO transition using Raman and reflectivity methods.

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/content/aip/journal/jap/100/1/10.1063/1.2212087
2006-07-11
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Applications of Raman spectroscopy in copper chemical mechanical planarization: In situ detection of tantalum layer to dielectric layer transition
http://aip.metastore.ingenta.com/content/aip/journal/jap/100/1/10.1063/1.2212087
10.1063/1.2212087
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