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Using scaling laws to understand the growth mechanism of atomic layer deposited films on methyl-terminated surfaces
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10.1063/1.2363241
/content/aip/journal/jap/100/11/10.1063/1.2363241
http://aip.metastore.ingenta.com/content/aip/journal/jap/100/11/10.1063/1.2363241
/content/aip/journal/jap/100/11/10.1063/1.2363241
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/content/aip/journal/jap/100/11/10.1063/1.2363241
2006-12-01
2014-12-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Using scaling laws to understand the growth mechanism of atomic layer deposited WNxCy films on methyl-terminated surfaces
http://aip.metastore.ingenta.com/content/aip/journal/jap/100/11/10.1063/1.2363241
10.1063/1.2363241
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