Influence of target to substrate spacing on the composition (from EDX analysis). Note: The solid line is only a guide to the eyes.
XRD spectrum of CuCl film deposited at a target to substrate distance of .
Variation in FWHM of (111) peak with target to substrate spacing (grain size in the right axis).
Variation in the FWHM of the (111) XRD peak of CuCl thin films with sputtering pressure (grain size in the right axis).
AFM topographs of CuCl films grown at different sputtering pressures of (a) and (b) (scale bar = 1 μm).
Schematic representation of the “particle-particle” and “grain-grain” interfaces.
CL spectra of CuCl films deposited at different sputtering pressures of (a) , (b) , and (c) .
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