Bright-field TEM image of the thin film (a) as-deposited and (b) annealed for at .
X-ray diffraction pattern for as-deposited thin film.
Bright-field TEM images of the thin film annealed at (a) for and (b) for .
(a) Bright-field TEM image of the thin film after further annealing at for . (b) Selected-area diffraction patterns of the as-deposited thin film (bottom half) compared to the sample after annealing at various times and temperatures, including at (top half.)
EDX spectra of the CoCu samples taken for a granule (spectrum I) and the matrix between granules (spectrum II).
Room-temperature magnetoresistance of film annealed under the same condition as in Fig. 1(b).
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