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Electronic structure and ferromagnetic properties of Cu-doped AlN from first principles
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10.1063/1.2745282
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    Affiliations:
    1 Key Laboratory of Interface Science and Engineering in Advanced Materials, Ministry of Education, Taiyuan University of Technology, Taiyuan 030024, People’s Republic of China and College of Materials Science and Engineering, Taiyuan University of Technology, Taiyuan 030024, People’s Republic of China
    2 Key Laboratory of Interface Science and Engineering in Advanced Materials, Ministry of Education, Taiyuan University of Technology, Taiyuan 030024, People’s Republic of China and College of Chemistry and Chemical Engineering, Taiyuan University of Technology, Taiyuan 030024, People’s Republic of China
    a) Author to whom correspondence should be addressed; electronic mail: xubs@public.ty.sx.cn
    J. Appl. Phys. 101, 113918 (2007); http://dx.doi.org/10.1063/1.2745282
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/content/aip/journal/jap/101/11/10.1063/1.2745282
2007-06-13
2014-07-12
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electronic structure and ferromagnetic properties of Cu-doped AlN from first principles
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/11/10.1063/1.2745282
10.1063/1.2745282
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