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Correlation of gas-phase composition with film properties in the plasma-enhanced chemical vapor deposition of hydrogenated amorphous carbon nitride films
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10.1063/1.2424402
/content/aip/journal/jap/101/2/10.1063/1.2424402
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/2/10.1063/1.2424402

Figures

Image of FIG. 1.
FIG. 1.

Schematic of the experimental apparatus used for film deposition and optical emission spectroscopy studies.

Image of FIG. 2.
FIG. 2.

Schematic diagram of the apparatus used for the MS studies. The plasma reactor source is nearly identical to the reactor used for film deposition studies (Fig. 1).

Image of FIG. 3.
FIG. 3.

Typical AFM images of films prepared with different gas compositions: (a) (57:43), (b) (58:42), and (c) (55:45). Films were deposited at a total reactor pressure of with .

Image of FIG. 4.
FIG. 4.

Variation in (a) rms surface roughness and (b) deposition rate as a function of fraction in the feed. Films were deposited with a total pressure of at .

Image of FIG. 5.
FIG. 5.

XPS and spectra from films prepared with different gas mixtures. Films were deposited with a total pressure of at . The spectra were decomposed into three features at , , and , arising from phase, phase, and C–O bonds, respectively.

Image of FIG. 6.
FIG. 6.

ratios determined by XPS as a function of fraction in the feed for plasmas produced at a reactor pressure of with . The ratios were estimated from the area ratio of the to XPS lines using the relative sensitivity factors. Open circles show data taken at an elevated reactor pressure .

Image of FIG. 7.
FIG. 7.

Typical optical emission spectra of (a) , (b) , and (c) (50:50) plasmas with a total reactor pressure of and .

Image of FIG. 8.
FIG. 8.

Typical optical emission spectra of (a) and (b) (50:50) plasmas with a total reactor pressure of and .

Image of FIG. 9.
FIG. 9.

Optical emission spectral intensities of excited state species from (a) , (b) , and (c) plasmas as a function of fraction in the feed. Plasmas were produced at a total reactor pressure of with .

Image of FIG. 10.
FIG. 10.

Typical positive ion mass spectra in , , and plasmas produced at a total reactor pressure of .

Image of FIG. 11.
FIG. 11.

Typical positive ion mass spectra in , , and plasmas produced at a total reactor pressure of .

Image of FIG. 12.
FIG. 12.

Typical positive ion mass spectra in , , and plasmas produced at a total reactor pressure of .

Image of FIG. 13.
FIG. 13.

Ion energy distributions for , , , and ions in an plasma at a total reactor pressure of .

Tables

Generic image for table
Table I.

Possible emission species and transitions in the plasmas. [Assignments for transitions are taken from the literature (Refs. 5, 27, 28, and 47).]

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/content/aip/journal/jap/101/2/10.1063/1.2424402
2007-01-18
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Correlation of gas-phase composition with film properties in the plasma-enhanced chemical vapor deposition of hydrogenated amorphous carbon nitride films
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/2/10.1063/1.2424402
10.1063/1.2424402
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