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Low energy ion assisted deposition of films
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10.1063/1.2430705
/content/aip/journal/jap/101/2/10.1063/1.2430705
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/2/10.1063/1.2430705
/content/aip/journal/jap/101/2/10.1063/1.2430705
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/content/aip/journal/jap/101/2/10.1063/1.2430705
2007-01-23
2014-10-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Low energy ion assisted deposition of Ta∕Cu films
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/2/10.1063/1.2430705
10.1063/1.2430705
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