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Comparison of preferred orientation and stress in silver thin films on different substrates using x-ray diffraction
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10.1063/1.2401654
/content/aip/journal/jap/101/3/10.1063/1.2401654
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/3/10.1063/1.2401654

Figures

Image of FIG. 1.
FIG. 1.

Schematics of x-ray diffraction with tilt angles ranging from to 56° using the geometry. The tilt angles selected, regarding overlaps, were , , , 30.2°, 45°, and 56°. indicates the Bragg angle for the (420) diffraction from a thin film.

Image of FIG. 2.
FIG. 2.

(Color online) AFM images of (a) and (b) PEN surfaces prior to Ag deposition.

Image of FIG. 3.
FIG. 3.

XRD scans for Ag thin films on and PEN substrates.

Image of FIG. 4.
FIG. 4.

{111} pole figures for Ag thin films on and PEN substrates.

Image of FIG. 5.
FIG. 5.

{200} pole figures for Ag thin films on and PEN substrates.

Image of FIG. 6.
FIG. 6.

(Color online) Three-dimensional contour plots of pole figures for (a) Ag {111} on PEN, (b) Ag {200} on PEN, (c) Ag {111} on , and (d) Ag {200} on .

Image of FIG. 7.
FIG. 7.

The interplanar spacing of the (420) diffraction vs plots for Ag thin films on and PEN with tilt angles ranging from to 56°.

Image of FIG. 8.
FIG. 8.

Texture map of Ag thin films on amorphous substrates showing the expected texture during the grain growth. When the strain energy is increased in thin films, the transition line for the texture is changed from a solid line to a dotted line. (The transition line is defined as a dividing line between surface energy minimizing (111) and strain energy minimizing (200) texture areas.)

Tables

Generic image for table
Table I.

Strain and stress tensor components for Ag thin films on and PEN.

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/content/aip/journal/jap/101/3/10.1063/1.2401654
2007-02-05
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparison of preferred orientation and stress in silver thin films on different substrates using x-ray diffraction
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/3/10.1063/1.2401654
10.1063/1.2401654
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